CVD Graphene Growth Equipment for Metal Foil Substrates (100-300)
CVD Graphene Growth Equipment for Metal Foil Substrates (100-300)
Sale price¥10,000.00
Product specification
Rated Power
0-10,000 RPM
Operating Temperature
RT (Room Temperature) - 1150°C
Pressure
10^-2 Pa to Atmospheric Pressure
Width
Roll-to-Roll: Width 100-1000 mm; Static: 297 × 420 mm or 2, 4, 6-inch wafers
Process Adaptability and Applications
Suitable for graphene, carbon nanotubes, boron nitride, etc.
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